JOSEPHSON INTEGRATED-CIRCUIT PROCESS FOR SCIENTIFIC APPLICATIONS

被引:30
|
作者
SANDSTROM, RL
KLEINSASSER, AW
GALLAGHER, WJ
RAIDER, SI
机构
关键词
D O I
10.1109/TMAG.1987.1065115
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1484 / 1488
页数:5
相关论文
共 50 条
  • [1] JOSEPHSON INTEGRATED CIRCUIT PROCESS FOR SCIENTIFIC APPLICATIONS.
    Sandstrom, R.L.
    Kleinsasser, A.W.
    Gallagher, W.J.
    Raider, S.I.
    IEEE Transactions on Magnetics, 1986, MAG-23 (02)
  • [2] A SIMPLE AND ROBUST NIOBIUM JOSEPHSON JUNCTION INTEGRATED-CIRCUIT PROCESS
    BARFKNECHT, AT
    RUBY, RC
    KO, H
    IEEE TRANSACTIONS ON MAGNETICS, 1991, 27 (02) : 3125 - 3128
  • [4] AN ALL REFRACTORY NBN JOSEPHSON JUNCTION MEDIUM SCALE INTEGRATED-CIRCUIT PROCESS
    KERBER, GL
    COOPER, JE
    FRY, HW
    KING, GR
    MORRIS, RS
    SPARGO, JW
    TOTH, AG
    JOURNAL OF APPLIED PHYSICS, 1990, 68 (09) : 4853 - 4860
  • [5] INTEGRATED-CIRCUIT PROCESS MODELING
    HILL, C
    BUTLER, AL
    INSTITUTE OF PHYSICS CONFERENCE SERIES, 1984, (69): : 161 - 180
  • [6] HIGH-SPEED JOSEPHSON INTEGRATED-CIRCUIT TECHNOLOGY
    HASUO, S
    IEEE TRANSACTIONS ON MAGNETICS, 1989, 25 (02) : 740 - 749
  • [7] LEC GAAS FOR INTEGRATED-CIRCUIT APPLICATIONS
    KIRKPATRICK, CG
    CHEN, RT
    HOLMES, DE
    ASBECK, PM
    ELLIOTT, KR
    FAIRMAN, RD
    OLIVER, JR
    SEMICONDUCTORS AND SEMIMETALS, 1984, 20 : 159 - 231
  • [8] MICROWAVE APPLICATIONS OF INTEGRATED-CIRCUIT TECHNIQUES
    UHLIR, A
    PROCEEDINGS OF THE IEEE, 1964, 52 (12) : 1617 - &
  • [9] INTEGRATED-CIRCUIT FABRICATION - A PROCESS OVERVIEW
    SEQUEDA, FO
    JOURNAL OF METALS, 1985, 37 (05): : 43 - 50
  • [10] RESPONSE OF HIGH RF-TC SNS JOSEPHSON MICROBRIDGES SUITABLE FOR INTEGRATED-CIRCUIT APPLICATIONS
    ONO, RH
    BEALL, JA
    CROMAR, MW
    HARVEY, TE
    JOHANSSON, ME
    REINTSEMA, CD
    RUDMAN, DA
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1991, 38 (12) : 2717 - 2717