THE EFFECTS OF UV IRRADIATION ON TITANIA DEPOSITION FROM TITANIUM TETRA-ISOPROPOXIDE

被引：4

作者：

EGASHIRA, Y

SUGIMACHI, M

NISHIZAWA, K

SAITO, K

OSAWA, T

KOMIYAMA, H

机构：

[1] Department of Chemical Engineering, Faculty of Engineering, University of Tokyo, Bunkyo-ku, Tokyo, 113

来源：

APPLIED SURFACE SCIENCE | 1994年 / 79-80卷

关键词：

D O I：

10.1016/0169-4332(94)90442-1

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The influence of UV irradiation on the deposition of titania from titanium tetra-isopropoxide (TTIP) under reduced pressure was studied. It was found that UV irradiation accelerates the titania growth rate by a factor of 2-3 in the temperature range of 573 to 623 K. The coverage quality of micron-size trenches in the cases with and without UV irradiation indicates the role of the photo-enhanced surface reaction. The threshold wavelength of 380 nm which is equivalent to the energy gap of anatase indicates strongly that band-to-band excitation is responsible for the photo-enhanced surface reaction.

引用

页码：389 / 392

页数：4

共 6 条

[1]

EGASHIRA Y, J PHYS PARIS, V4

[2] ELECTROCHEMICAL PHOTOLYSIS OF WATER AT A SEMICONDUCTOR ELECTRODE [J].