RADIATION-INDUCED DEFECTS IN SIO2 AS DETERMINED WITH XPS

被引:193
|
作者
GRUNTHANER, FJ
GRUNTHANER, PJ
MASERJIAN, J
机构
关键词
D O I
10.1109/TNS.1982.4336387
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1462 / 1466
页数:5
相关论文
共 50 条
  • [41] SYNCHROTRON RADIATION-INDUCED DIRECT PROJECTION PATTERNING OF ALUMINUM ON SI AND SIO2 SURFACES
    UESUGI, F
    NISHIYAMA, I
    IEICE TRANSACTIONS ON ELECTRONICS, 1993, E76C (01) : 47 - 54
  • [42] THERMAL AND RADIATION-INDUCED MOBILITIES OF CHARGE-COMPENSATING IONS IN CRYSTALLINE SIO2
    MARTIN, JJ
    RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1983, 74 (1-4): : 141 - 144
  • [43] Radiation induced structural changes in amorphous SiO2: I. Point defects
    Devine, R.A.B.
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1992, 31 (12 B): : 4411 - 4421
  • [44] CHARGE-PUMPING STUDY OF RADIATION-INDUCED DEFECTS AT SI-SIO2 INTERFACE
    AUTRAN, JL
    BALLAND, B
    VALLARD, JP
    BABOT, D
    JOURNAL DE PHYSIQUE III, 1994, 4 (09): : 1707 - 1721
  • [45] Studies of Radiation-Induced Defects in Li2SiO3:Sm Phosphor Material
    Singh, N.
    Singh, Vijay
    Watanabe, S.
    Rao, T. K. Gundu
    Chubaci, J. F. D.
    Cano, N. F.
    Pathak, M. S.
    Singh, Pramod K.
    Dhoble, S. J.
    JOURNAL OF ELECTRONIC MATERIALS, 2017, 46 (01) : 451 - 457
  • [46] Studies of Radiation-Induced Defects in Li2SiO3:Sm Phosphor Material
    N. Singh
    Vijay Singh
    S. Watanabe
    T. K. Gundu Rao
    J. F. D. Chubaci
    N. F. Cano
    M. S. Pathak
    Pramod K. Singh
    S. J. Dhoble
    Journal of Electronic Materials, 2017, 46 : 451 - 457
  • [47] A STUDY OF AR IMPLANTATION INDUCED DEFECTS IN SIO2
    DEVINE, RAB
    FERRIEU, F
    GOLANSKI, A
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1983, 209 (MAY): : 1201 - 1206
  • [48] Electronic mechanism of thermal destruction of radiation-induced E′-centers in crystalline and glassy SiO2
    Zatsepin, A. F.
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2011, 357 (8-9) : 1856 - 1859
  • [49] THE CHEMICAL-STRUCTURE OF TRAPPED CHARGE SITES FORMED AT THE SI/SIO2 INTERFACE BY IONIZING-RADIATION AS DETERMINED BY XPS
    GRUNTHANER, FJ
    LEWIS, BF
    MASERJIAN, J
    MADHUKAR, A
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03): : 747 - 750
  • [50] MOLECULAR-DIFFUSION IN A SIO2 - ITS ROLE IN ANNEALING RADIATION-INDUCED DEFECT CENTERS
    PFEFFER, RL
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (03) : C135 - C135