STUDY OF RADIATION-INDUCED REACTIONS IN CHEMICALLY AMPLIFIED RESISTS FOR ELECTRON-BEAM AND X-RAY-LITHOGRAPHY

被引:13
作者
KOZAWA, T [1 ]
YOSHIDA, Y [1 ]
UESAKA, M [1 ]
TAGAWA, S [1 ]
机构
[1] UNIV TOKYO, NUCL SCI & TECHNOL RES CTR, TOKAI, IBARAKI 31911, JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1992年 / 31卷 / 11A期
关键词
CHEMICALLY AMPLIFIED RESIST; ONIUM SALT; M-CRESOL; PROTONATION; PROTON ADDUCT; PULSE RADIOLYSIS;
D O I
10.1143/JJAP.31.L1574
中图分类号
O59 [应用物理学];
学科分类号
摘要
The radiation-induced reactions of the onium salts in model compound solutions of chemically amplified electron beam (EB) and X-ray resists have been studied by means of nanosecond pulse radiolysis. It is found that the onium salts scavenge electrons and promote the generation of proton adducts. On the basis of experimental results, the reaction mechanisms of the chemically amplified EB and X-ray resists have been estimated. It can be presumed that proton adducts of basepolymers play an important role in acid generation.
引用
收藏
页码:L1574 / L1576
页数:3
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