STUDY OF RADIATION-INDUCED REACTIONS IN CHEMICALLY AMPLIFIED RESISTS FOR ELECTRON-BEAM AND X-RAY-LITHOGRAPHY

被引：13

作者：

KOZAWA, T ^{[1
]}

YOSHIDA, Y ^{[1
]}

UESAKA, M ^{[1
]}

TAGAWA, S ^{[1
]}

机构：

[1] UNIV TOKYO, NUCL SCI & TECHNOL RES CTR, TOKAI, IBARAKI 31911, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1992年 / 31卷 / 11A期

关键词：

CHEMICALLY AMPLIFIED RESIST; ONIUM SALT; M-CRESOL; PROTONATION; PROTON ADDUCT; PULSE RADIOLYSIS;

D O I：

10.1143/JJAP.31.L1574

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The radiation-induced reactions of the onium salts in model compound solutions of chemically amplified electron beam (EB) and X-ray resists have been studied by means of nanosecond pulse radiolysis. It is found that the onium salts scavenge electrons and promote the generation of proton adducts. On the basis of experimental results, the reaction mechanisms of the chemically amplified EB and X-ray resists have been estimated. It can be presumed that proton adducts of basepolymers play an important role in acid generation.

引用

页码：L1574 / L1576

页数：3

共 9 条

[1] A STUDY OF THE EFFECT OF KEY PROCESSING VARIABLES ON THE LITHOGRAPHIC PERFORMANCE OF MICROPOSIT SAL601-ER7 RESIST [J].

BLUM, L ;

PERKINS, ME ;

LIU, HY .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06) :2280-2285

[2]

DAMMEL R, 1992, P AM CHEM SOC DIV PO, V66, P184

[3] CHEMICAL AMPLIFICATION IN THE DESIGN OF DRY DEVELOPING RESIST MATERIALS [J].

ITO, H ;

WILLSON, CG .

POLYMER ENGINEERING AND SCIENCE, 1983, 23 (18) :1012-1018

[4]

ITO H, 1991, ACS SYM SER, V475, P326

[5]

LINGNAU J, 1990, POLYM MICROELECTRONI, P445

[6] EFFECT OF ACID DIFFUSION ON RESOLUTION OF A CHEMICALLY AMPLIFIED RESIST IN X-RAY-LITHOGRAPHY [J].

NAKAMURA, J ;

BAN, H ;

DEGUCHI, K ;

TANAKA, A .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1991, 30 (10) :2619-2625

[7]

NOVEMBRE AE, 1990, POLYM PREPR AM CHEM, V31, P379

[8]

TAGAWA S, 1992, P AM CHEM SOC, V66, P188

[9] PULSE-RADIOLYSIS OF POLYSTYRENE AND BENZENE IN CYCLOHEXANE, CHLOROFORM AND CARBON-TETRACHLORIDE [J].

WASHIO, M ;

TAGAWA, S ;

TABATA, Y .

RADIATION PHYSICS AND CHEMISTRY, 1983, 21 (1-2) :239-243

← 1 →