THICKNESS OF THE ION SHEATH AROUND A CYLINDRICAL ELECTRODE IN A PLASMA

被引:13
作者
NACHMAN, M
THANH, PC
机构
[1] Department of Electrical Engineering, Ecole Polytechnique, Montreal, PQ, H3C 3A7, P.O. Box 6079, Station A
关键词
D O I
10.1109/27.106841
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
The results of an experimental study of the thickness of the ion sheath set up at the interface between a cylindrical electrode and the plasma in which it is immersed are presented. A point-like, movable, electron-collecting cold probe is used for exploring the sheath region. The cylindrical electrode is biased negatively, and a low-frequency low-voltage ac signal is superimposed on this dc bias. The modulation of the electron density within the sheath, induced by this ac signal, manifests itself by a modulation in the current measured by the electron-collecting probe. The ac component of this current has a maximum peak value around the sheath-plasma boundary. The position of the point-like probe (relative to the cylindrical electrode) where the ac current is maximum is determined with a high degree of accuracy by means of a precision optical theodolite. Reliable data for the sheath thickness and its dependence on the absolute value of the applied dc bias could thus be obtained.
引用
收藏
页码:423 / 427
页数:5
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