Inhibition of Copper Pitting Corrosion in Aggressive Potable Waters

被引:20
作者
Sarver, Emily [1 ]
Edwards, Marc [2 ]
机构
[1] Virginia Tech Univ, Dept Min & Minerals Engn, 108 Holden Hall, Blacksburg, VA 24061 USA
[2] Virginia Tech Univ, Dept Civil & Environm Engn, Blacksburg, VA 24061 USA
关键词
D O I
10.1155/2012/857823
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Copper pitting corrosion can lead to premature plumbing failures, and can be caused by aggressive potable waters characterized by high pH, free chlorine residual and low alkalinity. In such waters and under continuous flow, certain inhibitors including phosphate, silica or natural organic matter may greatly reduce pitting occurrence. In the current work, 1mg/L phosphate (as P) completely prevented initiation of pits, and 5 mg/L silica (as Si) significantly decelerated pitting. However, much lower doses of these inhibitors had little benefit and actually accelerated the rate of attack in some cases. Effects of organic matter were dependent on both the type (e. g., natural versus ozonated humic substances) and dosage. Dose- response effects of free chlorine and alkalinity were also investigated. Based on electrochemical data, pits initiated more rapidly with increased free chlorine, but even moderate levels of chlorine (similar to 0.4mg/L) eventually caused severe pitting. High alkalinity decreased pit propagation rates but did not prevent pit formation.
引用
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页数:16
相关论文
共 36 条
[1]  
[Anonymous], 2004, COMMUNICATION
[2]  
[Anonymous], 1994, G6494 ASTM
[3]   THE CORROSION OF COPPER BY CHLORINATED DRINKING WATERS [J].
ATLAS, D ;
COOMBS, J ;
ZAJICEK, OT .
WATER RESEARCH, 1982, 16 (05) :693-698
[4]  
AWWA, 1998, STAND METH
[5]  
CAMPBELL HS, 1954, J APPL CHEM, V4, P633
[6]  
Cocks F., 1973, MANUAL IND CORROSION
[7]   Effect of Chlorine Concentration on Natural Pitting of Copper as a Function of Water Chemistry [J].
Cong, Hongbo ;
Scully, John R. .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2010, 157 (05) :C200-C211
[8]   Use of Coupled Multielectrode Arrays to Elucidate the pH Dependence of Copper Pitting in Potable Water [J].
Cong, Hongbo ;
Scully, John R. .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2010, 157 (01) :C36-C46
[9]   Passivity and Pit Stability Behavior of Copper as a Function of Selected Water Chemistry Variables [J].
Cong, Hongbo ;
Michels, Harold T. ;
Scully, John R. .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2009, 156 (01) :C16-C27
[10]  
Custalow B., 2009, THESIS