REFLECTION AND SELF-SPUTTERING OF NICKEL AT OBLIQUE ANGLES OF ION INCIDENCE

被引：6

作者：

HECHTL, E ^{[1
]}

ECKSTEIN, W ^{[1
]}

ROTH, J ^{[1
]}

机构：

[1] MAX PLANCK INST PLASMA PHYS,EURATOM ASSOC,D-85748 GARCHING,GERMANY

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1994年 / 90卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(94)95603-0

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Measurement of the erosion yield of a target under ion bombardment using the weight change determines the sum of the sputtering yield and the particle reflection coefficient. The different erosion behavior of a volatile (Kr) and a nonvolatile projectile (Ni) are investigated on a nickel target in the energy range from 60 eV to 10 keV at an incidence angle of 75-degrees. The angular dependence of the erosion yield is studied for 100, 500, and 2500 eV. In comparison with Monte Carlo calculations using the TRIM.SP program it is shown that at low energies (< 200 eV) the weight change method determines mainly the particle reflection coefficient, whereas the sputtering yield dominates at higher energies (> 1 keV).

引用

页码：505 / 508

页数：4

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