A STATISTICAL-ANALYSIS OF ULTRAVIOLET, X-RAY, AND CHARGED-PARTICLE LITHOGRAPHIES

被引：62
作者：
SMITH, HI
机构：
[1] MIT, Cambridge, MA, USA, MIT, Cambridge, MA, USA
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1986年 / 4卷 / 01期
关键词：
D O I：
10.1116/1.583367
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
12
引用
收藏
页码：148 / 153
页数：6
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