LOCAL ATOMIC-STRUCTURE IN THIN-FILMS OF SILICON-NITRIDE AND SILICON DIIMIDE PRODUCED BY REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION

被引：294
作者：
TSU, DV
LUCOVSKY, G
MANTINI, MJ
机构：
来源：
PHYSICAL REVIEW B | 1986年 / 33卷 / 10期
关键词：
D O I：
10.1103/PhysRevB.33.7069
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：7069 / 7076
页数：8
相关论文
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