REACTIVELY SPUTTERED AIN FILMS FOR GAAS ANNEALING CAPS

被引：24

作者：

ESTE, G

SURRIDGE, R

WESTWOOD, WD

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 03期

关键词：

D O I：

10.1116/1.573771

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：989 / 992

页数：4

共 19 条

[1]

HANTZPERGUE JJ, 1985, VIDE, V225, P13

[2] SYNTHESIS OF COMPOUND THIN-FILMS BY DUAL ION-BEAM DEPOSITION .1. EXPERIMENTAL APPROACH [J].

HARPER, JME ;

CUOMO, JJ ;

HENTZELL, HTG .

JOURNAL OF APPLIED PHYSICS, 1985, 58 (01) :550-555

[3]

HATA T, 1980, JPN J APPL PHYS S203, V20, P145

[4] COMPRESSIVE STRESS TRANSITION IN AL, V, ZR, NB AND W METAL-FILMS SPUTTERED AT LOW WORKING PRESSURES [J].

HOFFMAN, DW ;

THORNTON, JA .

THIN SOLID FILMS, 1977, 45 (02) :387-396

[5]

INGREY SJ, UNPUB

[6]

KIM B, 1985, ELECTRON LETT, V21, P259

[7]

MACMAHON R, 1982, J VAC SC TECHNOL, V20, P376

[8]

Maissel L.I., 1970, HDB THIN FILM TECHNO, P12

[9] TRANSPARENT CONDUCTING ZINC-OXIDE AND INDIUM TIN OXIDE-FILMS PREPARED BY MODIFIED REACTIVE PLANAR MAGNETRON SPUTTERING [J].

MANIV, S ;

MINER, CJ ;

WESTWOOD, WD .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (03) :1370-1375

[10] DISCHARGE CHARACTERISTICS FOR MAGNETRON SPUTTERING OF AL IN AR AND AR-O-2 MIXTURES [J].

MANIV, S ;

WESTWOOD, WD .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (03) :743-751

← 1 2 →