HELIUM ADSORPTION ON EXFOLIATED GRAPHITE

被引：31

作者：

GOELLNER, GJ

DAUNT, JG

LERNER, E

机构：

[1] STEVENS INST TECHNOL,CRYOGENICS CTR,HOBOKEN,NJ 07030

[2] FED UNIV RIO DE JANEIRO,INST PHYS,RIO DE JANEIRO,BRAZIL

来源：

JOURNAL OF LOW TEMPERATURE PHYSICS | 1975年 / 21卷 / 3-4期

关键词：

D O I：

10.1007/BF01141331

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：347 / 358

页数：12

共 13 条

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MCLEAN, EO ;

VILCHES, OE .

PHYSICAL REVIEW A, 1973, 8 (03) :1589-1615

[2]

Daunt J. G., 1970, Journal of Low Temperature Physics, V3, P89, DOI 10.1007/BF00628400

[3] Adsorption of He-3 and He-4 on Copper and on Argon-Coated Copper Below 20 K [J].

Daunt, J. G. ;

Lerner, E. .

JOURNAL OF LOW TEMPERATURE PHYSICS, 1972, 8 (1-2) :79-92

[4]

DAUNT JG, 1973, MONOLAYER SUBMONOLAY, P19

[5] THERMODYNAMIC PROPERTIES OF LIQUID HE-3-HE-4 MIXTURES NEAR TRICRITICAL POINT .1. VAPOR-PRESSURE MEASUREMENTS AND THEIR THERMODYNAMIC ANALYSIS [J].

GOELLNER, G ;

BEHRINGER, R ;

MEYER, H .

JOURNAL OF LOW TEMPERATURE PHYSICS, 1973, 13 (1-2) :113-147

[6]

HEGDE SG, COMMUNICATION

[7]

JARVIS JF, 1967, THESIS DUKE U

[8] ADSORPTION OF HE-4,AR, AND N2 ON EXFOLIATED GRAPHITE AND OF HE-4 ON AR-COATED EXFOLIATED GRAPHITE AT LOW-TEMPERATURES [J].

LERNER, E ;

DAUNT, JG .

JOURNAL OF LOW TEMPERATURE PHYSICS, 1973, 10 (3-4) :299-307

[9] VIRIAL-COEFFICIENT ANALYSIS OF HELIUM ADSORPTION-ISOTHERMS [J].

NOVACO, AD .

JOURNAL OF LOW TEMPERATURE PHYSICS, 1975, 21 (3-4) :359-368

[10] THERMOMOLECULAR PRESSURE RATIOS FOR HE-3 AND HE-4 [J].

ROBERTS, TR ;

SYDORIAK, SG .

PHYSICAL REVIEW, 1956, 102 (02) :304-308

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