RAPID THERMAL-OXIDATION OF SILICON

被引:14
作者
ANG, ST [1 ]
WORTMAN, JJ [1 ]
机构
[1] N CAROLINA STATE UNIV,RALEIGH,NC 27695
关键词
D O I
10.1149/1.2108408
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:2361 / 2362
页数:2
相关论文
共 6 条
[1]   GENERAL RELATIONSHIP FOR THERMAL OXIDATION OF SILICON [J].
DEAL, BE ;
GROVE, AS .
JOURNAL OF APPLIED PHYSICS, 1965, 36 (12) :3770-&
[2]  
DEAL BE, LECTURE NOTES CEI
[3]  
IRENE EA, 1978, J ELCHEM SO, V125, P1149
[4]  
NARAYAN J, 1983, 41ST DEV RES C BURL
[5]   RAPID THERMAL-PROCESSING OF THIN GATE DIELECTRICS - OXIDATION OF SILICON [J].
NULMAN, J ;
KRUSIUS, JP ;
GAT, A .
IEEE ELECTRON DEVICE LETTERS, 1985, 6 (05) :205-207
[6]  
SHAFER SA, 1982, J VAC SCI TECHNOL, V21, P422