MAGNETIC-PROPERTIES OF ELECTRODEPOSITED CO-W THIN-FILMS

被引：31

作者：

ADMON, U

DARIEL, MP

GRUNBAUM, E

LODDER, JC

机构：

[1] BEN GURION UNIV NEGEV,DEPT MAT ENGN,IL-84105 BEERSHEBA,ISRAEL

[2] TEL AVIV UNIV,FAC ENGN,DEPT ELECTR DEVICES & MAT,IL-69978 TEL AVIV,ISRAEL

[3] TWENTE UNIV TECHNOL,DEPT ELECT ENGN,ENSCHEDE,NETHERLANDS

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 05期

关键词：

D O I：

10.1063/1.339531

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1943 / 1947

页数：5

共 13 条

[1] MICROSTRUCTURE OF ELECTRODEPOSITED CO-W THIN-FILMS [J].

ADMON, U ;

DARIEL, MP ;

GRUNBAUM, E .

JOURNAL OF APPLIED PHYSICS, 1986, 59 (06) :2002-2009

[2] STRUCTURE AND MAGNETIC-PROPERTIES OF ELECTRO-DEPOSITED COBALT [J].

ARMYANOV, S ;

VITKOVA, S .

SURFACE TECHNOLOGY, 1978, 7 (04) :319-329

[3]

BONDAR VV, 1968, ELECTRODEPOSITION ME, P71

[4]

CHIKAZUMI S, 1964, PHYSICS MAGNETISM, P248

[5]

CULITY BD, 1972, INTRO MAGNETIC MATER, P136

[6]

KROHN A, 1971, PLATING MAR, P237

[7] HIGH COERCIVE FORCE FILMS OF COBALT-NICKEL WITH ADDITIONS OF GROUP-VA AND GROUP-VIB ELEMENTS [J].

LUBORSKY, FE .

IEEE TRANSACTIONS ON MAGNETICS, 1970, MAG6 (03) :502-&

[8]

MORRAL FR, 1967, PLATING JUN, P693

[9] STRUCTURE OF NONCRYSTALLINE CO-25 A/O W ELECTRODEPOSIT [J].

OMI, T ;

YAMAMOTO, H ;

GLASS, HL .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (02) :168-&

[10]

POLUKAROV YM, 1964, ELECTRODEPOSITION AL, P52

← 1 2 →