MAGNETIC-PROPERTIES OF ELECTRODEPOSITED CO-W THIN-FILMS

被引：31

作者：

ADMON, U

DARIEL, MP

GRUNBAUM, E

LODDER, JC

机构：

[1] BEN GURION UNIV NEGEV,DEPT MAT ENGN,IL-84105 BEERSHEBA,ISRAEL

[2] TEL AVIV UNIV,FAC ENGN,DEPT ELECTR DEVICES & MAT,IL-69978 TEL AVIV,ISRAEL

[3] TWENTE UNIV TECHNOL,DEPT ELECT ENGN,ENSCHEDE,NETHERLANDS

来源：

关键词：

D O I：

10.1063/1.339531

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1943 / 1947

页数：5

共 13 条

[1] MICROSTRUCTURE OF ELECTRODEPOSITED CO-W THIN-FILMS
ADMON, U
DARIEL, MP
GRUNBAUM, E
[J]. JOURNAL OF APPLIED PHYSICS, 1986, 59 (06) : 2002 - 2009
[2] STRUCTURE AND MAGNETIC-PROPERTIES OF ELECTRO-DEPOSITED COBALT
ARMYANOV, S
VITKOVA, S
[J]. SURFACE TECHNOLOGY, 1978, 7 (04): : 319 - 329
[3] BONDAR VV, 1968, ELECTRODEPOSITION ME, P71
[4] CHIKAZUMI S, 1964, PHYSICS MAGNETISM, P248
[5] CULITY BD, 1972, INTRO MAGNETIC MATER, P136
[6] KROHN A, 1971, PLATING MAR, P237
[7] HIGH COERCIVE FORCE FILMS OF COBALT-NICKEL WITH ADDITIONS OF GROUP-VA AND GROUP-VIB ELEMENTS
LUBORSKY, FE
[J]. IEEE TRANSACTIONS ON MAGNETICS, 1970, MAG6 (03) : 502 - &
[8] MORRAL FR, 1967, PLATING JUN, P693
[9] STRUCTURE OF NONCRYSTALLINE CO-25 A/O W ELECTRODEPOSIT
OMI, T
YAMAMOTO, H
GLASS, HL
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (02) : 168 - &
[10] POLUKAROV YM, 1964, ELECTRODEPOSITION AL, P52