Microstructural characterization of thin films obtained by laser irradiation

被引：0
作者：
Mengucci, P [1 ]
Barucca, G [1 ]
Marzocchini, R [1 ]
Leggieri, G [1 ]
机构：
[1] UNIV LECCE,DIPARTIMENTO FIS,I-73100 LECCE,ITALY
来源：
MICROSCOPY MICROANALYSIS MICROSTRUCTURES | 1995年 / 6卷 / 5-6期
关键词：
D O I：
10.1051/mmm:1995158
中图分类号：
TH742 [显微镜];
学科分类号：
摘要：
Thin films obtained by direct pulsed excimer laser irradiation and by laser reactive ablation were characterized by scanning electron microscopy, cross sectional transmission electron microscopy and grazing angle X-ray diffraction. The results obtained were interpreted in function of the deposition parameters such as substrate temperature, pressure of the ambient atmosphere, number of laser pulses and laser fluence.
引用
收藏
页码：685 / 692
页数：8
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