X-RAY MASK REPLICATION USING SQUARE SYNCHROTRON-RADIATION ILLUMINATION

被引：1

作者：

REILLY, M ^{[1
]}

WELLS, GM ^{[1
]}

GUO, J ^{[1
]}

WALLACE, JP ^{[1
]}

EDWARDS, N ^{[1
]}

CERRINA, F ^{[1
]}

MELNGAILIS, J ^{[1
]}

机构：

[1] MIT,CAMBRIDGE,MA 02139

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1993年 / 11卷 / 06期

关键词：

D O I：

10.1116/1.586570

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

X-ray masks are an expensive part of the x-ray lithographic technology. The overall mask making process can be simplified and the cost reduced by a judiciously applied replication process. It is desirable that the copy has negligible feature bias and minimal placement distortion. It should therefore be produced by a process that has the greatest possible latitude with respect to dose and gap. In this article, it is described how these conditions are met. The latitude requirement is met by engineering the exposure system so that the source has a prescribed amount of spatial incoherence. This technique is an extension of the zero magnification method used by Wells et al. [J. Vac. Sci. Technol. B 10, 3221 (1992)]. This approach is particularly well suited for synchrotron-based x-ray lithography.

引用

页码：2971 / 2975

页数：5

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