DRY ETCHING OF POLYIMIDE IN O2-CF4 AND O2-SF6 PLASMAS

被引：0
|
作者：
TURBAN, G [1 ]
RAPEAUX, M [1 ]
机构：
[1] UNIV NANTES,PHYS CORPUSCULAIRE LAB,ERA 924,F-44072 NANTES,FRANCE
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 03期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
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页码：C83 / C83
页数：1
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