INTERFACE EFFECTS IN THE FORMATION OF SILICON-OXIDE ON METAL SILICIDE LAYERS OVER SILICON SUBSTRATES

被引：58
作者：
BAGLIN, JEE
DHEURLE, FM
PETERSSON, CS
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1983年 / 54卷 / 04期
关键词：
D O I：
10.1063/1.332821
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：1849 / 1854
页数：6
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