IN-SITU OPTICAL MEASUREMENT USING OPTICAL FIBERS FOR A-SIH ULTRA-THIN FILMS - THEORETICAL AND NUMERICAL-ANALYSIS

被引：0

作者：

LEBLANC, F

MAEDA, Y

MINEMURA, T

机构：

[1] Hitachi Research Laboratory, Hitachi Ltd, Hitachi-shi

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1993年 / 32卷 / 10B期

关键词：

OPTICAL FIBER; THIN FILM; A-SH; ABSORPTION;

D O I：

10.1143/JJAP.32.L1546

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A new in situ optical characterization technique, consisting of measuring the transmittance of a multimode optical fiber when depositing a hydrogenated amorphous silicon (a-Si:H) thin film on the unclad core, is theoretically and numerically analyzed. Due to a large interferential effect, an apparent increase of the optical gap occurs when decreasing the film thickness below 10 nm. The same effect allows the measurement of the absorption coefficient at a given wavelength in the mid-gap region, lower than 5 cm-1 for 20-nm-thick films. The method is a promising tool to investigate the Density of States (DOS) of a-Si:H ultra-thin films.

引用

页码：L1546 / L1548

页数：3