IN-SITU OPTICAL MEASUREMENT USING OPTICAL FIBERS FOR A-SIH ULTRA-THIN FILMS - THEORETICAL AND NUMERICAL-ANALYSIS

被引：0
作者：
LEBLANC, F
MAEDA, Y
MINEMURA, T
机构：
[1] Hitachi Research Laboratory, Hitachi Ltd, Hitachi-shi
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1993年 / 32卷 / 10B期
关键词：
OPTICAL FIBER; THIN FILM; A-SH; ABSORPTION;
D O I：
10.1143/JJAP.32.L1546
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
A new in situ optical characterization technique, consisting of measuring the transmittance of a multimode optical fiber when depositing a hydrogenated amorphous silicon (a-Si:H) thin film on the unclad core, is theoretically and numerically analyzed. Due to a large interferential effect, an apparent increase of the optical gap occurs when decreasing the film thickness below 10 nm. The same effect allows the measurement of the absorption coefficient at a given wavelength in the mid-gap region, lower than 5 cm-1 for 20-nm-thick films. The method is a promising tool to investigate the Density of States (DOS) of a-Si:H ultra-thin films.
引用
收藏
页码：L1546 / L1548
页数：3
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