FORMATION AND PROPERTIES OF POROUS SILICON AND ITS APPLICATION

被引:148
作者
WATANABE, Y [1 ]
ARITA, Y [1 ]
YOKOYAMA, T [1 ]
IGARASHI, Y [1 ]
机构
[1] NIPPON TELE & TEL PUBL CORP,ELECT COMMUN LAB,MUSASHINO,TOKYO,JAPAN
关键词
D O I
10.1149/1.2134015
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:1351 / 1355
页数:5
相关论文
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JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1958, 105 (07) :402-408
[2]   ELECTROLYTIC SHAPING OF GERMANIUM AND SILICON [J].
UHLIR, A .
BELL SYSTEM TECHNICAL JOURNAL, 1956, 35 (02) :333-347
[3]  
WATANABE Y, 1971, REV ELEC COMMUN LAB, V19, P899