SOFT-X-RAY PHOTOEMISSION-STUDY OF THE SILICON FLUORINE ETCHING REACTION

被引：150

作者：

MCFEELY, FR

MORAR, JF

HIMPSEL, FJ

机构：

来源：

SURFACE SCIENCE | 1986年 / 165卷 / 01期

关键词：

D O I：

10.1016/0039-6028(86)90675-8

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：277 / 287

页数：11

共 13 条

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