A HIGH-INTENSITY MULTISAMPLE CS SPUTTER SOURCE

被引：2
|
作者：
SOUTHON, JR [1 ]
IYER, IS [1 ]
机构：
[1] UNIV MANITOBA,DEPT PHYS,WINNIPEG R3T 2N2,MANITOBA,CANADA
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1990年 / 47卷 / 03期
基金：
加拿大自然科学与工程研究理事会;
关键词：
D O I：
10.1016/0168-583X(90)90761-I
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
We have developed a high-intensity Cs sputter negative ion source with a very simple layout of potentials and with multisample capability. The design and present performance of the prototype source are described and possible improvements are discussed. © 1990.
引用
收藏
页码：299 / 302
页数：4
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