A LARGE ALUMINUM-ALLOY MOLECULAR-BEAM EPITAXY CHAMBER WITH AN ULTIMATE PRESSURE OF 7.5X10-12TORR

被引：10

作者：

CHEN, JR ^{[1
]}

NARUSHIMA, K ^{[1
]}

MIYAMOTO, M ^{[1
]}

ISHIMARU, H ^{[1
]}

机构：

[1] NATL LAB HIGH ENERGY PHYS,OHO,IBARAKI 305,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 06期

关键词：

D O I：

10.1116/1.572890

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2200 / 2204

页数：5

共 9 条

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CHEN, JR ;

NARUSHIMA, K ;

ISHIMARU, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (06) :2188-2191

ISHIMARU, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (02) :1170-1175

[3]

KUMAGI H, 1983, VACUUM SCI ENG, P154

[4]

MIYAMOTO M, 1984, 8TH P S ISIAT84, V187

[5]

Narushima K., 1984, Journal of the Vacuum Society of Japan, V27, P457, DOI 10.3131/jvsj.27.457

[6]

NARUSHIMA K, 1982, J VAC SOC JPN, V25, P172

[7]

NARUSHIMA K, 1983, JPN J VAC SOC, V26, P353

[8]

SUEMITSU M, 1984, 5TH P M UHV TECHN AC, V63

[9] MODULATING ION CURRENT PRESSURE GAUGE [J].

WATANABE, F ;

HIRAMATSU, S ;

ISHIMARU, H .