ION-BEAM INDUCED MODIFICATION OF ENERGY OF ADHESION FOR COPPER-FILMS ON AL2O3 SUBSTRATES

被引：21
作者：
SOOD, DK [1 ]
BAGLIN, JEE [1 ]
机构：
[1] IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1987年 / 19-20卷
关键词：
D O I：
10.1016/S0168-583X(87)80192-1
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
引用
收藏
页码：954 / 958
页数：5
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