EFFECTS OF STRESS ON THE STABILITY OF X-RAY MASKS

被引：29

作者：

KARNEZOS, M

机构：

[1] Hewlett-Packard Lab, Palo Alto, CA,, USA, Hewlett-Packard Lab, Palo Alto, CA, USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1986年 / 4卷 / 01期

关键词：

D O I：

10.1116/1.583444

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

LITHOGRAPHY

引用

页码：226 / 229

页数：4

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[9]

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[10]

YARWOOD TM, 1953, ACOUSTICS

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