PHOTOINDUCED DEGRADATION OF ALPHA-SI-H DIODES WITH AN NIN STRUCTURE

被引：30

作者：

PFLEIDERER, H

KUSIAN, W

KRUHLER, W

机构：

来源：

SOLID STATE COMMUNICATIONS | 1984年 / 49卷 / 05期

关键词：

D O I：

10.1016/0038-1098(84)90671-9

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

引用

页码：493 / 495

页数：3

共 14 条

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