RELAXATION OF THE EDGE ATOMS OF A STEPPED CU(410) SURFACE

被引：6
|
作者：
VISSCHER, B [1 ]
BOERS, AL [1 ]
VERHEIJ, LK [1 ]
POELSEMA, B [1 ]
机构：
[1] FORSCHUNGSZENTRUM JULICH, INST GRENZFLACHENFORSCHUNG & VAKUUMPHYS, D-5170 JULICH 1, FED REP GER
来源：
APPLIED SURFACE SCIENCE | 1986年 / 26卷 / 01期
关键词：
CRYSTALS;
D O I：
10.1016/0169-4332(86)90057-7
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The edge atom position of the stepped Cu(410) surface has been investigated with low energy ion scattering (LEIS) using 10-20 kev H** plus . It is possible to determine the atomic position by utilizing atomic shadowing effects. The scattered particles are analyzed with a time-of-flight spectrometer. This means that we can detect scattered hydrogen leaving the copper surface in the neutral state as well as in the charged state, so the influence of neutralizatian of the scattered particles along different outgoing trajectories is eliminated. We find an inward relaxation of the edge atoms; assuming that this relaxation takes place in the (100) plane it amounts to about 8% of the interlayer spacing.
引用
收藏
页码：121 / 128
页数：8
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