KONDO EFFECT IN CU(FE) FILMS

被引：35
作者：
BLACHLY, MA
GIORDANO, N
机构：
[1] Department of Physics, Purdue University, West Lafayette
来源：
PHYSICAL REVIEW B | 1994年 / 49卷 / 10期
关键词：
D O I：
10.1103/PhysRevB.49.6788
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Recent experiments have shown that the Kondo effect is suppressed in thin films, a result which has so far eluded theoretical explanation. The previous experiments have been limited to the regime T greater than or similar to T(K), where T(K) is the Kondo temperature. In this paper we present results for T less than or similar to T(K) which demonstrate that even when the Kondo contribution to the resistivity, DELTA(rho)K, is greatly suppressed, the Kondo temperature itself is not affected. We also present the results of experiments involving bilayer samples, i.e., Kondo films covered by nonmagnetic layers, which demonstrate the existence of a Kondo ''proximity effect.''
引用
收藏
页码：6788 / 6793
页数：6
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