SILENT-DISCHARGE DRIVEN EXCIMER UV SOURCES AND THEIR APPLICATIONS

被引:154
作者
KOGELSCHATZ, U
机构
[1] Asea Brown Boveri Corporate Research
关键词
D O I
10.1016/0169-4332(92)90080-H
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The generation of incoherent excimer radiation at different ultraviolet (UV) and vacuum ultraviolet (VUV) wavelengths in silent electrical discharges (dielectric-barrier discharges) is discussed. Different geometrical discharge configurations including windowless VUV sources are presented. Applications of these UV sources include photodeposition techniques for metal, dielectric or semiconductor layers, surface modification as well as patterned material removal for the microstructuring of large-area polymer surfaces.
引用
收藏
页码:410 / 423
页数:14
相关论文
共 85 条
[1]   SURFACE-ANALYSIS AND CHARACTERIZATION OF LARGE PRINTED-CIRCUIT-BOARD CIRCUITIZATION PROCESS STEPS [J].
AUERBACH, DJ ;
BRUNDLE, CR ;
MILLER, DC .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1988, 32 (05) :669-681
[2]   PHOTOENHANCED DEPOSITION OF SILICON-OXIDE THIN-FILMS USING A NOVEL WINDOWLESS INTERNAL NITROGEN DISCHARGE LAMP [J].
BAKER, SD ;
MILNE, WI ;
ROBERTSON, PA .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1988, 46 (04) :243-248
[3]  
BAUERLE D, 1986, CHEM PROCESSING LASE
[4]   PHOTOCHEMICALLY GENERATED GOLD CATALYST FOR SELECTIVE ELECTROLESS PLATING OF COPPER [J].
BAUM, TH .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1990, 137 (01) :252-255
[5]   DEVELOPMENT OF A NOVEL LARGE AREA EXCIMER LAMP FOR DIRECT PHOTO DEPOSITION OF THIN-FILMS [J].
BERGONZO, P ;
PATEL, P ;
BOYD, IW ;
KOGELSCHATZ, U .
APPLIED SURFACE SCIENCE, 1992, 54 :424-429
[6]   THE DIRECT PHOTOCHEMICAL VAPOR-DEPOSITION OF SIO2 FROM SI2H6 AND N2O3 MIXTURES [J].
BHATNAGAR, YK ;
MILNE, WI .
THIN SOLID FILMS, 1989, 168 (02) :345-352
[7]   DIRECT UV PHOTOENHANCED CHEMICAL VAPOR-DEPOSITION OF A-SI-H FROM DISILANE USING A DEUTERIUM LAMP [J].
BHATNAGAR, YK ;
MILNE, WI .
THIN SOLID FILMS, 1988, 163 :237-240
[8]  
BOYD IW, 1987, LASER PROCESSING THI
[9]   ULTRAVIOLET PHOTOABLATION OF A PLASMA-SYNTHESIZED FLUOROCARBON POLYMER [J].
BRANNON, JH ;
SCHOLL, D ;
KAY, E .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1991, 52 (02) :160-166
[10]   VACUUM ULTRAVIOLET DRIVEN CHEMICAL VAPOR-DEPOSITION OF LOCALIZED ALUMINUM THIN-FILMS [J].
CALLOWAY, AR ;
GALANTOWICZ, TA ;
FENNER, WR .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02) :534-536