PREPARATION OF COXFE3-XO4 FILMS IN AQUEOUS-SOLUTION AT 120-200-DEGREES-C BY HYDROTHERMAL FERRITE PLATING

被引:4
作者
ITOH, T [1 ]
ZHANG, Q [1 ]
ABE, M [1 ]
TAMAURA, Y [1 ]
机构
[1] TOKYO INST TECHNOL,DEPT CHEM,MEGURO KU,TOKYO 152,JAPAN
关键词
D O I
10.1063/1.349924
中图分类号
O59 [应用物理学];
学科分类号
摘要
Ferrite plating facilitates the formation of polycrystalline spinel films in an aqueous solution below 100°C. The plating temperature can be extended up to 200°C when the pressure of the reaction solution is kept high (15-20 kgf/cm2). We call this "hydrothermal ferrite plating," by which solubility limit of Ni in Fe3-xNixO 4 increases much, from x=0.3 (by conventional ferrite plating at 90°C) to x=0.93.1 In this paper we describe preparation of Fe3-xCoxO4 films by the hydrothermal ferrite plating at T=120-200°C and p=15-40 kgf/cm2, and report their structural and magnetic properties. Plating for 1 h, we obtained films about 1 μm in thickness, which are polycrystalline with no preferential crystal orientation as observed by x-ray diffraction. The solubility limit of Co, which is x=0.6 at 90°C, increases to x=1.3 at 180°C. The solubility limit of Co is higher than that of Ni, which may be because Ni tends to keep 2+ state in the spinel structure, while Co can take both 2+ and 3+ states. When prepared at 200°C, the saturation magnetization of the films are smaller than that reported for bulk samples, though both agree when the films are prepared at 90°C.2 This suggests that Co is oxidized to 3+ state even when x<1.0 as large as the Fe3-xCo xO4 films are prepared in the hydrothermal conditions. We found that adding CH3COONH4 into the reaction solution as a pH buffer improves the smoothness of the film surface.
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页码:6443 / 6443
页数:1
相关论文
共 2 条
[1]   FERRITE PLATING OF FE3 O4 AND FE3-X NIX O4 FILMS AT 100-DEGREES-C-200-DEGREES-C [J].
ITOH, T ;
ABE, M ;
SASAO, T ;
TAMAURA, Y .
IEEE TRANSACTIONS ON MAGNETICS, 1989, 25 (05) :4230-4232
[2]  
ITOH T, 1989, J MAGN SOC JPN, V13, P869