TEMPERATURE DISTRIBUTION DURING HEATING USING A HIGH REPETITION RATE PULSED LASER

被引:26
作者
HABA, B
HUSSEY, BW
GUPTA, A
机构
[1] IBM Thomas J. Watson Research Center, Yorktown Heights
关键词
D O I
10.1063/1.348595
中图分类号
O59 [应用物理学];
学科分类号
摘要
A general equation has been derived for computing the temperature distribution produced in a substrate heated by a high repetition rate pulsed laser. The theoretical predictions have been compared with experimental results obtained for etching of Mn-Zn ferrite in KOH solution using a copper vapor laser. The effects of the laser power and substrate scan speed on the temperature distribution have been investigated, and the predicted melt-zone boundaries have been compared with the experimentally observed width, depth, and shape of the etched grooves.
引用
收藏
页码:2871 / 2876
页数:6
相关论文
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