LASER-BEAM LITHOGRAPHED MICRO-FRESNEL LENSES

被引:59
作者
HARUNA, M
TAKAHASHI, M
WAKAHAYASHI, K
NISHIHARA, H
机构
[1] Osaka University, Electronics Department, Suita, Osaka, 565
[2] Mitsubishi Electric Company, Amagasaki, 661
[3] Ministry of International Trade and Industry, Kita-ku, Tokyo, 115
来源
APPLIED OPTICS | 1990年 / 29卷 / 34期
关键词
Integrated optics; Microlenses; Microlithography;
D O I
10.1364/AO.29.005120
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Laser beam lithography for micro-Fresnel lenses (MFLs) with blazed grooves is proposed and demonstrated including the system configuration and characteristics of the resulting lenses. The resolution is even better than that of electron-beam lithography in forming 1-jum deep relief gratings in resist. A laser beam lithographed MFL with a diameter as large as 9.6 mm is described as well as a compact MFL (N.A. 0.21) butt coupled to an optical waveguide. In these two distinct MFLs, nearly diffraction-limited spot sizes have been obtained with diffraction efficiencies of 50% or more. A specific MFL array used for an integrated optic laser Doppler velocimeter is also presented. © 1990 Optical Society of America.
引用
收藏
页码:5120 / 5126
页数:7
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