MASKLESS ETCHING OF GAAS AND INP USING A SCANNING MICROPLASMA

被引：24

作者：

OCHIAI, Y

GAMO, K

NAMBA, S

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1983年 / 1卷 / 04期

关键词：

D O I：

10.1116/1.582672

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1047 / 1049

页数：3

共 9 条

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