LOW-ENERGY ION-ASSISTED DEPOSITION OF METAL-FILMS

被引：19
作者：
ROY, R
机构：
[1] IBM Research Division, T.J. Watson Research Center, Yorktown Heights, NY
来源：
SURFACE & COATINGS TECHNOLOGY | 1992年 / 51卷 / 1-3期
关键词：
D O I：
10.1016/0257-8972(92)90239-7
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
A review is given of ion-beam-assisted (IBAD) metal film growth, focusing on ion beam techniques. Common experimental techniques including ion-beam-assisted evaporation and dual-ion-beam sputtering are described. Emphasis is placed on ion-bombardment-induced changes in film properties, including stress, resistivity, hardness, and magnetic properties. In addition, effects on film microstructure including grain size, texture, grain shape, and impurity incorporation are detailed. The themes emphasized in this review include (1) the complex relationship between changes in experimental deposition parameters and changes in film properties and microstructure, (2) current understanding of microstructure-property relations in ion-assisted films, and (3) important mechanisms for ion-assisted metal film growth.
引用
收藏
页码：203 / 211
页数：9
相关论文
共 50 条
[11]   MASKLESS FOCUSED ION BEAM-ASSISTED DEPOSITION OF METAL-FILMS [J].
GAMO, K ;
NAMBA, S .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (08) :C356-C356
[12]   Low temperature epitaxial silicon films deposited by ion-assisted deposition [J].
Wagner, TA ;
Oberbeck, L ;
Bergmann, RB .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2002, 89 (1-3) :319-322
[13]   Ion-assisted deposition of silver thin films [J].
Lee, CC ;
Lee, TY ;
Jen, YJ .
THIN SOLID FILMS, 2000, 359 (01) :95-97
[14]   Ion-Assisted Magnetron Deposition of AlN Films [J].
Selyukov R.V. ;
Naumov V.V. .
Russian Microelectronics, 2023, 52 (Suppl 1) :S194-S198
[15]   Low-energy ion-assisted control of interfacial structures in metallic multilayers [J].
Quan, J. J. ;
Zhou, X. W. ;
Wadley, H. N. G. .
JOURNAL OF CRYSTAL GROWTH, 2007, 300 (02) :431-439
[16]   Deposition of Titanium Dioxide Thin Films by Low-Pressure Ion-Assisted Deposition [J].
Sainty, Wayne G. .
SOCIETY OF VACUUM COATERS 59TH ANNUAL TECHNICAL CONFERENCE PROCEEDINGS, 2016, 2016, :259-265
[17]   Growth mode of ultrathin Co films on Fe(001) prepared by low energy ion-assisted deposition [J].
Luches, P ;
di Bona, A ;
Borghi, A ;
Giovanardi, C ;
Valeri, S .
SURFACE REVIEW AND LETTERS, 1999, 6 (05) :747-752
[18]   Low-energy ion beam-assisted deposition of giant magnetoresistive thin films [J].
Guilfoyle, S.J. ;
Pollard, R.J. ;
Grundy, P.J. .
Journal of Applied Physics, 1996, 79 (8 pt 2A)
[19]   Texture development in titanium nitride films grown by low-energy ion assisted deposition [J].
Rauschenbach, B ;
Gerlach, JW .
CRYSTAL RESEARCH AND TECHNOLOGY, 2000, 35 (6-7) :675-688
[20]   Low-energy ion beam-assisted deposition of giant magnetoresistive thin films [J].
Guilfoyle, SJ ;
Pollard, RJ ;
Grundy, PJ .
JOURNAL OF APPLIED PHYSICS, 1996, 79 (08) :4939-4941
12345