HIGH-TEMPERATURE SUPERCONDUCTING YBA2CU3O7-X FILMS ON METALLIC SUBSTRATES GROWN INSITU BY OFF-AXIS SPUTTERING

被引：12

作者：

JIA, QX

ANDERSON, WA

机构：

[1] Department of Electrical and Computer Engineering, State University of New York at Buffalo, New York State Institute on Superconductivity, Amherst

来源：

APPLIED PHYSICS LETTERS | 1992年 / 60卷 / 21期

关键词：

D O I：

10.1063/1.106896

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

High temperature superconducting YBa2Cu3O7-x (YBCO) thin films were deposited on metallic substrate of Hastelloy C-276 using in situ off-axis rf magnetron sputtering from a single stoichiometric YBa2Cu3O7-x target. Highly c-axis oriented films with a zero resistance temperature of 84 K and critical current density of 1.6 x 10(4) A/cm2 at 77 K were obtained where BaTiO3 was used as a buffer layer. Scanning electron microscopy (SEM) surface scan showed quite good surface morphology of the films. The clear interfaces among different regions, confirmed by cross-sectional SEM analysis and Auger electron spectroscopy depth profiling, demonstrated BaTiO3 to be an effective buffer layer between YBCO and Hastelloy at a temperature as high as 640-degrees-C.

引用

页码：2689 / 2691

页数：3

共 12 条

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