DEPOSITION OF SIC FILMS BY PULSED EXCIMER LASER ABLATION

被引：55

作者：

BALOOCH, M ^{[1
]}

TENCH, RJ ^{[1
]}

SIEKHAUS, WJ ^{[1
]}

ALLEN, MJ ^{[1
]}

CONNOR, AL ^{[1
]}

OLANDER, DR ^{[1
]}

机构：

[1] UNIV CALIF BERKELEY,DEPT NUCL ENGN,BERKELEY,CA 94720

来源：

APPLIED PHYSICS LETTERS | 1990年 / 57卷 / 15期

关键词：

D O I：

10.1063/1.103346

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Thin films of β-SiC were grown on Si substrates by excimer laser pulse ablation of bulk SiC. The films were examined by Auger electron, x-ray, and photoelectron spectroscopies and laser ionization mass analysis techniques. The film was smooth as monitored by scanning electron microscopy. Scanning electron and scanning tunneling microscopy (STM) showed inclusions in the deposited SiC films, and laser ionization mass analysis detected SiC dimers in the vapor plume emitted from the target.

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页码：1540 / 1542

页数：3

相关论文

共 12 条

[1] BUFFER-LAYER TECHNIQUE FOR THE GROWTH OF SINGLE-CRYSTAL SIC ON SI [J].

ADDAMIANO, A ;

SPRAGUE, JA .

APPLIED PHYSICS LETTERS, 1984, 44 (05) :525-527

[2] Y-BA-CU-O SUPERCONDUCTING FILMS PRODUCED BY LONG-PULSE LASER VAPORIZATION [J].

BALOOCH, M ;

OLANDER, DR ;

RUSSO, RE .

APPLIED PHYSICS LETTERS, 1989, 55 (02) :197-199

[3] SURFACE STUDIES OF EPITAXIAL BETA-SIC ON SI(100) [J].

KAPLAN, R .

JOURNAL OF APPLIED PHYSICS, 1984, 56 (06) :1636-1641

[4] LASER WAVELENGTH DEPENDENT PROPERTIES OF YBA2CU3O7-DELTA THIN-FILMS DEPOSITED BY LASER ABLATION [J].

KOREN, G ;

GUPTA, A ;

BASEMAN, RJ ;

LUTWYCHE, MI ;

LAIBOWITZ, RB .

APPLIED PHYSICS LETTERS, 1989, 55 (23) :2450-2452

[5] EPITAXIAL-GROWTH AND CHARACTERIZATION OF BETA-SIC THIN-FILMS [J].

LIAW, P ;

DAVIS, RF .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (03) :642-648

[6] PRODUCTION OF LARGE-AREA SINGLE-CRYSTAL WAFERS OF CUBIC SIC FOR SEMICONDUCTOR-DEVICES [J].

NISHINO, S ;

POWELL, JA ;

WILL, HA .

APPLIED PHYSICS LETTERS, 1983, 42 (05) :460-462

[7]

ODA M, UNPUB

[8] LASER-PULSE-VAPORIZATION OF REFRACTORY MATERIALS [J].

OLANDER, DR .

PURE AND APPLIED CHEMISTRY, 1990, 62 (01) :123-138

[9] LASER-PULSE VAPORIZATION OF URANIUM-DIOXIDE AND OTHER REFRACTORY MATERIALS [J].

OLANDER, DR ;

YAGNIK, SK ;

TSAI, CH .

JOURNAL OF APPLIED PHYSICS, 1988, 64 (05) :2680-2695

[10]

RYAN CE, 1974, SIC 1973, P651