BEHAVIOR OF VARIOUS INSULATING FILMS IN HIGH-TEMPERATURE WATER AND MOISTURE

被引：5

作者：

MAEDA, K ^{[1
]}

SATO, J ^{[1
]}

BAN, Y ^{[1
]}

机构：

[1] FUJITSU LTD,DEPT IC DEVICE ENGN,KAWASAKI,KANAGAWA,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1977年 / 16卷 / 05期

关键词：

D O I：

10.1143/JJAP.16.729

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：729 / 736

页数：8

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[9] CONVERSION OF SILICON NITRIDE FILMS TO ANODIC SIO2 [J].

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[10] PASSIVATION COATINGS ON SILICON DEVICES [J].

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