REFLECTIVE MULTILAYER COATINGS FOR FAR UV REGION

被引：106

作者：

SPILLER, E ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

APPLIED OPTICS | 1976年 / 15卷 / 10期

关键词：

D O I：

10.1364/AO.15.002333

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：2333 / 2338

页数：6

共 23 条

[1]

[Anonymous], 1967, TECHNIQUES VACUUM UL

[2] INTERFERENCE FILTERS FOR FAR ULTRAVIOLET (1700 A TO 2400 A) [J].

BATES, B ;

BRADLEY, DJ .

APPLIED OPTICS, 1966, 5 (06) :971-&

[3] REFLECTANCE AND TRANSMITTANCE OF EVAPORATED ALUMINUM AND ALUMINUM - MAGNESIUM FLUORIDE FILMS IN ULTRAVIOLET (]1800 A) [J].

BATES, B ;

BRADLEY, DJ .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1967, 57 (04) :481-&

[4]

CHANG LL, 1975, EPITAXIAL GROWTH A, P37

[5]

Cho A. Y., 1975, Progress in Solid State Chemistry, V10, P157, DOI 10.1016/0079-6786(75)90005-9

[6] REPLICATION OF 0.1-MUM GEOMETRIES WITH X-RAY LITHOGRAPHY [J].

FEDER, R ;

SPILLER, E ;

TOPALIAN, J .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06) :1332-1335

[7] MULTILAYER INTERFERENCE MIRRORS FOR XUV RANGE AROUND 100 EV PHOTON ENERGY [J].

HAELBICH, RP ;

KUNZ, C .

OPTICS COMMUNICATIONS, 1976, 17 (03) :287-292

[8]

HAGEMANN HJ, 1975, J OPT SOC AM, V65, P742, DOI 10.1364/JOSA.65.000742

[9] PHOTOABSORPTION COEFFICIENT OF ALLOYS OF AL WITH TRANSITION-METALS V, FE, NI AND WITH CU AND PR FROM 30 TO 150 EV PHOTON ENERGY [J].

HAGEMANN, HJ ;

GUDAT, W ;

KUNZ, C .

PHYSICA STATUS SOLIDI B-BASIC RESEARCH, 1976, 74 (02) :507-521

[10]

HASS G, 1974, 1972 P ICOIX SANT MO, P525

← 1 2 3 →