COLLIMATED MAGNETRON SPUTTER-DEPOSITION WITH GRAZING ANGLE ION-BOMBARDMENT

被引:15
|
作者
ROSSNAGEL, SM [1 ]
SWARD, R [1 ]
机构
[1] IBM CORP,DIV MICROELECTR,FISHKILL,NY 12524
关键词
D O I
10.1116/1.579433
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:156 / 158
页数:3
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