COLLIMATED MAGNETRON SPUTTER-DEPOSITION WITH GRAZING ANGLE ION-BOMBARDMENT

被引：15
|
作者：
ROSSNAGEL, SM [1 ]
SWARD, R [1 ]
机构：
[1] IBM CORP,DIV MICROELECTR,FISHKILL,NY 12524
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1995年 / 13卷 / 01期
关键词：
D O I：
10.1116/1.579433
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：156 / 158
页数：3
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