REVERSAL OF STEP ROUGHNESS ON GE-COVERED VICINAL SI(001)

被引:72
作者
WU, F
CHEN, X
ZHANG, ZY
LAGALLY, MG
机构
[1] University of Wisconsin, Madison
关键词
D O I
10.1103/PhysRevLett.74.574
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The influence of Ge on the equilibrium step morphologies of vicinal Si(001) has been investigated quantitatively using scanning tunneling microscopy. As the Ge coverage Ge increases, the relative roughness of the two types of steps on the surface reverses. Physically, the accompanying evolving (2×n) reconstruction modifies the kink energetics by introducing a new type of kink, and confines step meandering. The energies associated with these new kinks and the dependence of the step energies on Ge are extracted. © 1995 The American Physical Society.
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页码:574 / 577
页数:4
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