LIFETIME OF DOMINANT RADICALS FOR THE DEPOSITION OF A-SI-H FROM SIH4 AND SI2H6 GLOW-DISCHARGES

被引：40
作者：
MATSUDA, A
KAGA, T
TANAKA, H
TANAKA, K
机构：
来源：
JOURNAL OF NON-CRYSTALLINE SOLIDS | 1983年 / 59-6卷 / DEC期
关键词：
D O I：
10.1016/0022-3093(83)90264-8
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
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页码：687 / 690
页数：4
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