MAGNETORESISTANCE IN ELECTRODEPOSITED NI-FE-CU/CU MULTILAYERS

被引：43

作者：

ATTENBOROUGH, K ^{[1
]}

HART, R ^{[1
]}

LANE, SJ ^{[1
]}

ALPER, M ^{[1
]}

SCHWARZACHER, W ^{[1
]}

机构：

[1] UNIV BRISTOL,DEPT GEOL,BRISTOL BS8 1RJ,AVON,ENGLAND

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 1995年 / 148卷 / 1-2期

基金：

英国工程与自然科学研究理事会;

关键词：

D O I：

10.1016/0304-8853(95)89007-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Multilayers of Ni-Fe-Cu/Cu have been electrodeposited from a single electrolyte onto polycrystalline (100) textured and (100) single crystal copper substrates. Bilayer thicknesses as low as 30 Angstrom have been achieved, as confirmed by X-ray diffraction. Room temperature magnetoresistance measurements show the presence of giant magnetoresistance (GMR) and an anisotropic magnetoresistance (AMR) component in the films.

引用

页码：335 / 336

页数：2

共 5 条

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HART, R ;

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YOUNES, C ;

SCHWARZACHER, W .

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[2]

Brenner A, 1963, ELECTRODEPOSITION AL, V1

[3] OSCILLATIONS IN GIANT MAGNETORESISTANCE AND ANTIFERROMAGNETIC COUPLING IN [NI81FE19/CU]N MULTILAYERS [J].

PARKIN, SSP .

APPLIED PHYSICS LETTERS, 1992, 60 (04) :512-514

[4]

Romankiw L.T., 1990, P S MAGNETIC MATERIA, V90-8, P339

[5]

van der Pauw L. J., 1958, PHILIPS RES REP, V13, P1

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