DEPTH RESOLUTION IN SPUTTER PROFILING

被引:87
|
作者
HOFMANN, S [1 ]
机构
[1] MAX PLANCK INST MET FORSCH,INST WERKSTOFFWISSENSCH,D-7000 STUTTGART 1,FED REP GER
来源
APPLIED PHYSICS | 1977年 / 13卷 / 02期
关键词
D O I
10.1007/BF00882481
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:205 / 207
页数:3
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