DEPTH RESOLUTION IN SPUTTER PROFILING

被引：87
作者：
HOFMANN, S [1 ]
机构：
[1] MAX PLANCK INST MET FORSCH,INST WERKSTOFFWISSENSCH,D-7000 STUTTGART 1,FED REP GER
来源：
APPLIED PHYSICS | 1977年 / 13卷 / 02期
关键词：
D O I：
10.1007/BF00882481
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：205 / 207
页数：3
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