COMPOSITIONS OF ELECTROLESS NICKEL PLATING BATHS BY P-31-NMR SPECTROSCOPY

被引：3

作者：

EUSTACE, DJ ^{[1
]}

ROSE, KD ^{[1
]}

机构：

[1] EXXON RES & ENGN CO,DIV ANALYT & INFORMAT,LINDEN,NJ 07036

来源：

关键词：

D O I：

10.1149/1.2120061

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1677 / 1680

页数：4

共 9 条

[1] CRITCHFIELD MM, 1967, 31P NUCLEAR MAGNETIC
[2] GORBUNOVA KM, 1965, ACHIEVEMENTS SCI CHE
[3] GUTZEIT G, 1959, PLATING, V46, P1377
[4] Gutzeit G., 1959, PLATING, V46, P1158
[5] GUTZEIT G, 1960, PLATING, V49, P63
[6] GUTZEIT G, 1959, PLATING, V46, P1275
[7] ELECTROLESS NICKEL PLATING ON SILICON
IWASA, H
YOKOZAWA, M
TERAMOTO, I
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (05) : 485 - &
[8] MCCLOSKEY JP, 1964, PLATING, V51, P689
[9] ELECTROLESS NICKEL PLATING FOR MAKING OHMIC CONTACTS TO SILICON
SULLIVAN, MV
EIGLER, JH
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1957, 104 (04) : 226 - 230