PROPERTIES OF AMORPHOUS CO-TA AND CO-W FILMS DEPOSITED BY RF SPUTTERING

被引：34

作者：

NAOE, M

KAZAMA, H

HOSHI, Y

YAMANAKA, S

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1982年 / 53卷 / 11期

关键词：

D O I：

10.1063/1.330217

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：7846 / 7848

页数：3

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