DEPOSITION OF STOICHIOMETRIC MOS2 THIN-FILMS BY PULSED LASER EVAPORATION

被引:36
作者
DONLEY, MS [1 ]
MCDEVITT, NT [1 ]
HAAS, TW [1 ]
MURRAY, PT [1 ]
GRANT, JT [1 ]
机构
[1] UNIV DAYTON,RES INST,DAYTON,OH 45469
关键词
D O I
10.1016/0040-6090(89)90017-5
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:335 / 344
页数:10
相关论文
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