EFFECT OF ELECTRON-BOMBARDMENT AND ANNEALING ON THE HYPERFINE-STRUCTURE IN A-SI-H (P)

被引:6
|
作者
SCHUTTE, S
FINGER, F
FUHS, W
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D O I
10.1016/0022-3093(89)90601-7
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
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页码:411 / 413
页数:3
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