PREPARATION OF C-AXIS-ORIENTED PBTIO3 THIN-FILMS BY MOCVD UNDER REDUCED PRESSURE

被引：115

作者：

OKADA, M

TAKAI, S

AMEMIYA, M

TOMINAGA, K

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1989年 / 28卷 / 06期

关键词：

D O I：

10.1143/JJAP.28.1030

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1030 / 1034

页数：5

共 9 条

[1]

IIJIMA K, 1986, J APPL PHYS, V60, P1

[2] PREPARATION AND PROPERTIES OF FERROELECTRIC PLZT THIN-FILMS BY RF SPUTTERING [J].

ISHIDA, M ;

MATSUNAMI, H ;

TANAKA, T .

JOURNAL OF APPLIED PHYSICS, 1977, 48 (03) :951-953

[3] RF PLANAR MAGNETRON SPUTTERING AND CHARACTERIZATION OF FERROELECTRIC PB(ZR,TI)O3 FILMS [J].

KRUPANIDHI, SB ;

MAFFEI, N ;

SAYER, M ;

ELASSAL, K .

JOURNAL OF APPLIED PHYSICS, 1983, 54 (11) :6601-6609

[4]

MORI Y, 1984, DENKI KAGAKU, V52, P407

[5] FERROELECTRIC PROPERTIES OF RF SPUTTERED PLZT THIN-FILM [J].

NAKAGAWA, T ;

YAMAGUCHI, J ;

USUKI, T ;

MATSUI, Y ;

OKUYAMA, M ;

HAMAKAWA, Y .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1979, 18 (05) :897-902

[6]

NAKAGAWA T, 1982, JPN J APPL PHYS, V21, pL665

[7]

OKADA M, 1988, NIPPON SERAM KYO GAK, V96, P687, DOI 10.2109/jcersj.96.687

[8] CHEMICAL VAPOR-DEPOSITION OF AL2O3 THIN-FILMS UNDER REDUCED PRESSURES [J].

SARAIE, J ;

KOWN, J ;

YODOGAWA, Y .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (04) :890-892

[9]

Yasuda T., 1986, Oyo Buturi, V55, P1024

← 1 →