PATTERN FIDELITY IN SUB-MICRON LITHOGRAPHY WITH A RECTANGULAR ELECTRON-BEAM

被引：8

作者：

OKUBO, T

TAKAMOTO, K

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1983年 / 22卷 / 08期

关键词：

D O I：

10.1143/JJAP.22.1335

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1335 / 1341

页数：7

共 12 条

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[7]

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[10]

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